Physics-Etch-0.01

Changes for version 0.01 - 2026-08-18

model wet and dry semiconductor etch processes

plasma-etch reactor geometry and derived conditions

anisotropic plasma / RIE dry etch model

the chemistry used by an etch process

minimal GDSII stream reader / writer

mask-pattern geometry for etch modelling

macro / micro loading and ARDE (RIE-lag) models

a material (film, mask, or substrate) in an etch model

base class for wet and dry etch process models

pattern/chamber/loading-aware etch simulation

isotropic, temperature-activated wet etch model

To install Physics::Etch, copy and paste the appropriate command in to your terminal.

cpanm Physics::Etch

perl -MCPAN -e shell
install Physics::Etch

For more information on module installation, please visit the detailed CPAN module installation guide.

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